用於檢測平面基板上之三維奈米結構的X光反射儀與其方法

工研院創新前瞻技術研究計畫

劉軍廷、吳文立、何柏青、陳國棟、吳昇勳、傅尉恩

本發明裝置與方法為應用X射線反射儀檢測平面基板上之三維奈米結構樣品，其樣品具微區檢測面積和奈米級薄膜厚度。此發明旨在解決X射線反射儀沿三個座標方向檢測都具有複雜奈米結構時所遇到的困難，複雜結構例如為具有奈米尺度之桿或軸陣列。使用長波長聚光X射線，波長大於一般商業銅靶材0.154 nm，且小於沿膜厚度方向的特徵尺寸之兩倍，並在入射光出口加裝適當的准直器，可測量微區和有限散射體積之樣品。

This invention relates to an apparatus and methods for applying X-ray reflectometry (XRR) in characterizing three dimensional nanostructures supported on a flat substrate with a miniscule sampling area and a thickness in nanometers.  In particular, this invention is targeted for addressing the difficulties encountered when XRR is applied to samples with intricate nanostructures along all three directions, e.g. arrays of nanostructured poles or shafts.  Convergent X-ray with long wavelength, greater than that from a copper anode or 0.154 nm and less than twice of the characteristic dimensions along the film thickness direction, is preferably used with appropriate collimations on both incident and detection arms to enable the XRR measurements of samples with limited sample area and scattering volumes.